1SOI sample with scratch on HSQ before exposure 640x480 | original size |
2110nm 640x480 | original size |
3230nm 640x480 | original size |
4bare Si with scratch 640x480 | original size |
5exposure and 2 min development 640x480 | original size |
6640x480 | original size |
7after 4 min development 640x480 | original size |
8640x480 | original size |
9thickness measurement after 4 min development 160nm 640x480 | original size |
10640x480 | original size |
11640x480 | original size |
12640x480 | original size |