![]() SOI sample with scratch on HSQ before exposure 640x480 | original size |
![]() 110nm 640x480 | original size |
![]() 230nm 640x480 | original size |
![]() bare Si with scratch 640x480 | original size |
![]() exposure and 2 min development 640x480 | original size |
![]() 640x480 | original size |
![]() after 4 min development 640x480 | original size |
![]() 640x480 | original size |
![]() thickness measurement after 4 min development 160nm 640x480 | original size |
![]() 640x480 | original size |
![]() 640x480 | original size |
![]() 640x480 | original size |