基板
  1: Si + Cr + Au (300 nm)  16.5 x 15 m/m
  2: Si                     20 x 20 (右上 10 - 10 無)

洗浄
  基板 2: Si 
  APM H2O2 : アンモニア水 : 純水 1:1:5 
  80 deg x 10 min

Spin Coat XR-1541-06 (HSQ 6 %)
  基板 1: Si + Cr + Au (300 nm)   2000 rpm
  基板 2: Si                      3000 rpm


Pre Bake
  150 deg x 2 min

 BEF conversion
--pec 有

DOSE 400

[08:03:06][HOST@f7000s:~]$  ./EBadmin/exposure-log  -F 2023-01-12 -g sekine -pbq -g sekine
from: 1 days ago
 to: 0 days ago
    EXP-     date    start    sec  rate hh:mm:ss BUF  adj   FP  mA WEC FocusPoint BEF  errors
-------- -------- -------- ------  ---- -------- --    --  [--] - ---------------  
 w  8558 20230112 16:09.37    122* 0.26  0:02.02 (1 -  63) [44]    GODA-LAB_sekine_16.5x15-Au 
 w  8559 20230112 16:18.20     99* 0.21  0:01.39 (1 -  63) [44]    GODA-LAB_sekine_16.5x15-Au 
 w  8560 20230112 16:23.30     65* 0.14  0:01.05 (1 -  63) [40]    GODA-LAB_sekine_16.5x15-Au 
 w  8561 20230112 16:26.21     56* 0.12  0:00.56 (1 -  63) [39]    GODA-LAB_sekine_16.5x15-Au 
 w  8562 20230112 16:28.54     57* 0.12  0:00.57 (1 -  63) [39]    GODA-LAB_sekine_16.5x15-Au 
 w  8563 20230112 16:30.43     57* 0.12  0:00.57 (1 -  63) [39]    GODA-LAB_sekine_16.5x15-Au 
 w  8564 20230112 16:34.35     57* 0.12  0:00.57 (1 -  63) [39]    GODA-LAB_sekine_16.5x15-Au 
 w  8565 20230112 16:37.10     57* 0.12  0:00.57 (1 -  63) [39]    GODA-LAB_sekine_16.5x15-Au 
 w  8566 20230112 16:40.37     54* 0.12  0:00.54 (1 -  63) [35]    GODA-LAB_sekine_16.5x15-Au 
 w  8567 20230112 16:45.03     53* 0.12  0:00.53 (1 -  63) [34]    GODA-LAB_sekine_16.5x15-Au 
 w  8568 20230112 16:46.56    374  0.82  0:06.14 (1 -  63) [33]    GODA-LAB_sekine_16.5x15-Au
 w  8571 20230112 17:02.53    374  0.82  0:06.14 (1 -  64) [33]    GODA-LAB_sekine_20x20-10-Si

現像 
  NMD-3 2 mins
  (少しだけ観察)
  +NMD-3 2 mins


VHX-6000
STM-7
DekTak